Effect of gamma ray irradiation on the conduction mechanisms of radio-frequency-sputtered Ta2O5 films

被引:0
|
作者
Wang, CW [1 ]
Chen, SF [1 ]
Lin, RD [1 ]
机构
[1] I Shou Univ, Dept Elect Engn, Ta Hsu Hsiang, Kaohsiung, Taiwan
关键词
D O I
10.1109/23.870864
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The microstructural and electrical conduction properties of sputtered Ta2O5 films pre-irradiated and gamma-ray-irradiated were systematically investigated. Analytical results revealed that the crystallinity and the leakage current of the pre-irradiated sample were effectively improved by raising the irradiation dose at low doses of irradiation [1 M similar to 4M rad(Ta2O5)]; however, higher doses of gamma-ray irradiation [>4 M rad(Ta2O5)] undesirably deteriorated the film crystallinity, yielding a larger leakage current. Such a result leads the Frenkel-Poole conduction (pre-irradiated sample) transformed to Schottky emission conduction process [low doses (1 M similar to 4 M rad(Ta2O5)) of gamma-ray-irradiated samples] and then gradually to the Frenkel-Poole conduction [high doses (>4 M rad(Ta2O5)) of gamma-ray-irradiated samples] again. The electrode-limited Schottky emission conduction effect dominantly occurring in the 1 M and 4 M rad(Ta2O5)-irradiated samples was deduced to be due to the repair of oxygen deficiency and the superior crystallinity of the Ta2O5 films caused by the low doses of gamma-ray irradiation. Contrarily, the major mechanism of bulk-limited Frenkel-Poole conduction happened in the pre-irradiated and 12 M rad(Ta2O5)-irradiated samples was suggested to be due to the deteriorated crystallinity and considerable oxygen vacancy in the Ta2O5 films.
引用
收藏
页码:1704 / 1709
页数:6
相关论文
共 50 条
  • [41] FLAWS IN ANODIC TA2O5 FILMS
    VERMILYEA, DA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (04) : 250 - 262
  • [42] FLAWS IN ANODIC TA2O5 FILMS
    HUBER, K
    VERMILYEA, DA
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1963, 110 (12) : 1286 - 1289
  • [43] CONDUCTION MECHANISM OF LEAKAGE CURRENT IN TA2O5 FILMS ON SI PREPARED BY LPCVD
    ZAIMA, S
    FURUTA, T
    KOIDE, Y
    YASUDA, Y
    LIDA, M
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1990, 137 (09) : 2876 - 2879
  • [44] Optical and electrical characterisation of Ta2O5 thin films for ionic conduction applications
    Porqueras, I
    Marti, J
    Bertran, E
    THIN SOLID FILMS, 1999, 343 : 449 - 452
  • [45] MOBILE ION-INDUCED DIELECTRIC-BREAKDOWN IN SPUTTERED TA2O5 FILMS
    BUSTA, HH
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1978, 125 (08) : C358 - C358
  • [46] The effect of heat treatment on the optical properties of Ta2O5 films
    Vol'pyan, OD
    Yakovlev, PP
    JOURNAL OF OPTICAL TECHNOLOGY, 2002, 69 (05) : 319 - 321
  • [47] DC ELECTRICAL-CONDUCTION IN THIN TA2O5 FILMS .2. HIGHLY IMPERFECT FILMS
    YOUNG, PL
    JOURNAL OF APPLIED PHYSICS, 1976, 47 (01) : 242 - 247
  • [48] Surface Acoustic Wave Properties of Amorphous Ta2O5 and Nb2O5 Thin Films Prepared by Radio Frequency Sputtering
    Kakio, Shoji
    Hosaka, Keiko
    Arakawa, Mototaka
    Ohashi, Yuji
    Kushibiki, Jun-ichi
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (07)
  • [49] Nanomechanical properties of pure and doped Ta2O5 and the effect of microwave irradiation
    Atanassova, E.
    Lytvyn, P.
    Dub, S. N.
    Konakova, R. V.
    Mitin, V. F.
    Spassov, D.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2012, 45 (47)
  • [50] Fabrication and evaluation of Ta2O5:Y2O3 co-sputtered thin films
    Miura, K.
    Osawa, T.
    Yokota, Y.
    Hanaizumi, O.
    RESULTS IN PHYSICS, 2014, 4 : 185 - 186