Connection between target poisoning and current waveforms in reactive high-power impulse magnetron sputtering of chromium

被引:9
|
作者
Layes, Vincent [1 ]
Corbella, Carles [1 ,3 ]
Monje, Sascha [1 ]
Schulz-von der Gathen, Volker [1 ]
von Keudell, Achim [1 ]
de los Arcos, Teresa [2 ]
机构
[1] Ruhr Univ Bochum, Inst Expt Phys 2, Univ Str 150, D-44780 Bochum, Germany
[2] Paderborn Univ, Tech & Macromol Chem, Warburgerstr 100, D-33098 Paderborn, Germany
[3] George Washington Univ, Dept Mech & Aerosp Engn, 800 22nd St NW, Washington, DC 20052 USA
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2018年 / 27卷 / 08期
关键词
HiPIMS; in-vacuum XPS; current waveform shape; oxidation state; chromium; MODEL;
D O I
10.1088/1361-6595/aad0e2
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Global models of high-power impulse magnetron sputtering (HiPIMS) plasmas in the literature predict a unique connection between target current waveform and oxidation state of the target (metallic versus poisoned): in the metallic mode, the current waveform reaches a plateau due to metal atom recycling, in the poisoned mode a triangular current waveform is predicted driven by plasma gas recycling. This hypothesis of such a unique connection is tested by measuring the surface chemical composition of chromium magnetron targets directly during reactive high-power impulse magnetron sputtering (r-HiPIMS) by spatially resolved x-ray photoelectron spectroscopy (XPS). The sputtering setup was connected to the ultra-high vacuum XPS spectrometer so that the targets could be transferred between the two chambers without breaking the vacuum. The O-2/Ar feed gas ratio, the input power and the pulse frequency of the HiPIMS plasmas were varied. The racetrack oxidation state was measured for different plasma parameters and correlated to the target current waveform shape. It was found that a shift of the target operation from the poisoned mode at low powers to the metallic mode at high powers when operating the discharge at 20 Hz pulse frequency occurs. The transition between these modes was directly correlated with analysis of the Cr2p core level peak on the complete target area. A unique correlation between the metallic and poisoned state of the target and the plateau and triangular current waveform was identified for very low powers and very high powers. In the intermediate power range, such a unique connection is absent. It is argued that the presence of already a small fraction of metal on the target may induce a plateau current waveform despite a significant oxidation of the target. This implies a finite contribution of metal sputtering during the pulse that dominates the recycling and leads to a plateau current waveform. Consequently, the shape of current waveforms cannot easily be connected to target poisoning, but a more detailed modeling of the recycling mechanisms is required.
引用
收藏
页数:10
相关论文
共 50 条
  • [41] An ionization region model for high-power impulse magnetron sputtering discharges
    Raadu, M. A.
    Axnas, I.
    Gudmundsson, J. T.
    Huo, C.
    Brenning, N.
    PLASMA SOURCES SCIENCE & TECHNOLOGY, 2011, 20 (06):
  • [42] Properties of Molybdenum Films Produced by High-Power Impulse Magnetron Sputtering
    Zakharov, A. N.
    Solov'ev, A. A.
    Oskomov, K. V.
    Oskirko, V. O.
    Semenov, V. A.
    Syrtanov, M. S.
    Bordulev, Yu S.
    RUSSIAN PHYSICS JOURNAL, 2017, 60 (08) : 1336 - 1340
  • [43] The statistics of spoke configurations in high-power impulse magnetron sputtering discharges
    Klein, P.
    Hnilica, J.
    Zemanek, M.
    Bradley, J. W.
    Vasina, P.
    JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2019, 52 (12)
  • [44] Enhanced properties of tungsten films by high-power impulse magnetron sputtering
    Engwall, A. M.
    Shin, S. J.
    Bae, J.
    Wang, Y. M.
    SURFACE & COATINGS TECHNOLOGY, 2019, 363 : 191 - 197
  • [45] Properties of Molybdenum Films Produced by High-Power Impulse Magnetron Sputtering
    A. N. Zakharov
    A. A. Solov’ev
    K. V. Oskomov
    V. O. Oskirko
    V. A. Semenov
    M. S. Syrtanov
    Yu. S. Bordulev
    Russian Physics Journal, 2017, 60 : 1336 - 1340
  • [46] Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
    Vlcek, J.
    Rezek, J.
    Houska, J.
    Kozak, T.
    Kohout, J.
    VACUUM, 2015, 114 : 131 - 141
  • [47] Gas Breakdown and Discharge Formation in High-Power Impulse Magnetron Sputtering
    Zuo, Xiao
    Chen, Rende
    Ke, Peiling
    Wang, Aiying
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2019, 47 (02) : 1215 - 1222
  • [48] A Method to Improve High-Power Impulse Magnetron Sputtering for Industrial Applications
    McLain, Jake
    Raman, Priya
    Shchelkanov, Ivan
    Armstrong, Sean
    Hrebik, Jason
    Jurczyk, Brian
    Stubbers, Robert
    Ruzic, David N.
    SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016, 2016, : 475 - 478
  • [49] Preface to Special Topic: Reactive high power impulse magnetron sputtering
    Hecimovic, A.
    Gudmundsson, J. T.
    JOURNAL OF APPLIED PHYSICS, 2017, 121 (17)
  • [50] Hysteresis-free reactive high power impulse magnetron sputtering
    Wallin, E.
    Helmersson, U.
    THIN SOLID FILMS, 2008, 516 (18) : 6398 - 6401