A thermodynamic estimation of the chemical vapor deposition of some borides

被引:19
|
作者
Peshev, P [1 ]
机构
[1] Bulgarian Acad Sci, Inst Gen & Inorgan Chem, BU-1113 Sofia, Bulgaria
关键词
borides; chemical vapor deposition; thermodynamic estimation; boron halides; boron hydrides;
D O I
10.1006/jssc.2000.8828
中图分类号
O61 [无机化学];
学科分类号
070301 ; 081704 ;
摘要
The temperature dependencies of the change in Gibbs energy for a series of probable reactions of chemical vapor deposition (CVD) of TiB2, ZrB2, NbB2, TaB2, and LaB6 using BCl3, BBr3, B2H6, B5H9, and B10H14 as boron sources have been plotted on the basis of thermodynamic data from the literature. It has been shown that from a thermodynamic point of view the deposition of these borides should proceed in all cases under milder conditions when boron hydrides are the boron sources. Is has been established that of the two boron halides BBr3 is the more suitable boron precursor in the CVD of the borides under consideration. Due to its properties this boron halide would probably prove especially appropriate for technological processes of transition metal diboride deposition. (C) 2000 Academic Press.
引用
收藏
页码:157 / 161
页数:5
相关论文
共 50 条
  • [11] THERMODYNAMIC CALCULATIONS FOR THE CHEMICAL VAPOR DEPOSITION OF SILICON CARBIDE.
    Kingon, Angus I.
    Lutz, Leonard J.
    Davis, Robert F.
    Liaw, P.
    1600, (66):
  • [12] Relevance of Thermodynamic and Kinetic Parameters of Chemical Vapor Deposition Precursors
    Selvakumar, J.
    Nagaraja, K. S.
    Sathiyamoorthy, D.
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2011, 11 (09) : 8190 - 8197
  • [13] THERMODYNAMIC ANALYSIS OF CHEMICAL-VAPOR-DEPOSITION FROM METHOXYSILANES
    SKAF, DW
    BURNS, KE
    JOURNAL OF MATERIALS SCIENCE, 1995, 30 (11) : 2895 - 2900
  • [14] Thermodynamic analysis for chemical vapor deposition diamond with the participation of chlorine
    Liu, ZJ
    Zhang, W
    Zhang, JY
    Wan, YZ
    Wang, JT
    Cao, CB
    Zhu, HS
    CHEMICAL JOURNAL OF CHINESE UNIVERSITIES-CHINESE, 1999, 20 (01): : 111 - 114
  • [15] Thermodynamic Analysis And Growth Of Zirconium Carbide By Chemical Vapor Deposition
    Wei, Sun
    Hua, Hao Zheng
    Xiang, Xiong
    NINETEENTH EUROPEAN CONFERENCE ON CHEMICAL VAPOR DEPOSITION (EUROCVD 19), 2013, 46 : 88 - 101
  • [16] Chemical vapor deposition of two-phase borides in the Hf-Si-B system
    Wuchina, EJ
    Opeka, MM
    Brown, JJ
    Joslyn, D
    More, K
    PROCEEDINGS OF THE THIRTEENTH INTERNATIONAL CONFERENCE ON CHEMICAL VAPOR DEPOSITION, 1996, 96 (05): : 750 - 756
  • [17] Chemical vapor deposition of metal borides .4. The application of polyhedral boron clusters to the chemical vapor deposition formation of gadolinium boride thin-film materials
    Kher, SS
    Tan, YX
    Spencer, JT
    APPLIED ORGANOMETALLIC CHEMISTRY, 1996, 10 (3-4) : 297 - 304
  • [18] ON PREPARATION OF CRYSTALLINE ALUMINUM BORIDES BY A VAPOR DEPOSITION PROCESS
    BLIZNAKOV, G
    PESHEV, P
    NIEMYSKI, T
    JOURNAL OF THE LESS-COMMON METALS, 1967, 12 (05): : 405 - +
  • [19] Co-deposition of TaC and SiC by chemical vapor deposition: A systematical thermodynamic exploration
    Huang, Wei
    Wang, Junjun
    Lu, Pengjian
    Xu, Qingfang
    Zhang, Chitengfei
    Peng, Jian
    Wang, Chuanbin
    Tu, Rong
    Zhang, Song
    SURFACE & COATINGS TECHNOLOGY, 2024, 491
  • [20] KINETIC AND THERMODYNAMIC ANALYSES OF CHEMICAL VAPOR-DEPOSITION OF ALUMINUM NITRIDE
    LEE, WY
    LACKEY, WJ
    AGRAWAL, PK
    JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1991, 74 (08) : 1821 - 1827