Carbon monoxide sensitivity of vacuum deposited polyaniline semiconducting thin films

被引:70
|
作者
Dixit, V
Misra, SCK
Sharma, BS
机构
[1] Natl Phys Lab, New Delhi 110012, India
[2] Agra Univ, Inst Basic Sci, Dept Phys, Agra 280004, Uttar Pradesh, India
关键词
conducting polymers; polyaniline; carbon monoxide; sensors; I-V measurements;
D O I
10.1016/j.snb.2004.05.001
中图分类号
O65 [分析化学];
学科分类号
070302 ; 081704 ;
摘要
By utilizing the semiconducting polymeric thin films on various substrates a new simple and quick technique has been developed for sensing carbon monoxide gas. The thin films of polyaniline were prepared by vacuum deposition. The particular doping combination in the polymer makes the sensor specific for detection of CO. Polyaniline was prepared by copolymerization of aniline and formaldehyde. Metal halides with specific concentrations were used as dopants to make polyaniline film specific for CO sensing. The thickness of the film was measured by using quartz thickness monitor. The thickness of the film was found the order of 1000 A. Sensitivity of the film is measured by using the relation S = (I-c - I-o)/I-o, where I-e is current after exposure and I-o is the current before exposure the sensor to CO, respectively. The sensor, investigated in the environment of various gases as CO, HCN and NH3, showed the high sensitivity of order 800 for carbon monoxide gas and response time of the sensor is 5 s for carbon monoxide gas. The fabrication process, the morphological, structural and electrical characterization of the sensor in regard to detection of CO has been described. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:90 / 93
页数:4
相关论文
共 50 条
  • [41] Fabrication and characterization of vacuum deposited fluorescein thin films
    Jalkanen, Pasi
    Kulju, Sampo
    Arutyunov, Konstantin
    Antila, Liisa
    Myllyperkio, Pasi
    Ihalainen, Teemu
    Kaariainen, Tommi
    Kaariainen, Marja-Leena
    Korppi-Tommola, Jouko
    THIN SOLID FILMS, 2011, 519 (11) : 3835 - 3839
  • [42] MOBILITY STUDIES ON VACUUM DEPOSITED PBTE THIN FILMS
    BERRY, WB
    JAYADEVA.TS
    THIN SOLID FILMS, 1969, 3 (01) : 77 - &
  • [43] METALLURGICAL PROPERTIES OF THIN ALUMINUM FILMS DEPOSITED IN VACUUM
    YAMAMOTO, H
    KAMOSHITA, G
    TRANSACTIONS OF THE JAPAN INSTITUTE OF METALS, 1971, 12 (01): : 49 - +
  • [44] Interdiffusion in vacuum-deposited dielectric thin films
    Lee, YJ
    Lee, JH
    Lee, YY
    Kang, YH
    Kim, YS
    Kwon, SN
    Jeong, K
    OPTICS COMMUNICATIONS, 2001, 190 (1-6) : 211 - 220
  • [45] Structure of vacuum-deposited permethyldecasilane thin films
    Ichino, Y.
    Minami, N.
    Yatabe, T.
    Shimomura, M.
    Kaito, A.
    Synthetic Metals, 1999, 101 (01): : 637 - 638
  • [46] STRUCTURAL PROPERTIES OF VACUUM DEPOSITED GASE THIN FILMS
    THOMAS, MB
    THIN SOLID FILMS, 1971, 8 (04) : 273 - &
  • [47] Photoluminescence characterization of vacuum deposited PTCDA thin films
    Bala, W
    Lukasiak, Z
    Rebarz, M
    Dalasinski, P
    Bratkowski, A
    Bauman, D
    Hertmanowski, R
    OPTO-ELECTRONICS REVIEW, 2004, 12 (04) : 445 - 448
  • [48] Vacuum deposited GeSbSe thin films for photonic applications
    Dikova, J.
    Todorov, R.
    Babeva, Tz
    17TH INTERNATIONAL SUMMER SCHOOL ON VACUUM, ELECTRON, AND ION TECHNOLOGIES (VEIT 2011), 2012, 356
  • [49] Preparation and properties of vacuum deposited AgBr thin films
    Georgieva, R
    Karashanova, D
    Starbov, N
    VACUUM, 2002, 69 (1-3) : 327 - 331
  • [50] Studies on the photoconductivity of vacuum deposited ZnTe thin films
    Rao, Gowrish K.
    Bangera, Kasturi V.
    Shivakumar, G. K.
    MATERIALS RESEARCH BULLETIN, 2010, 45 (10) : 1357 - 1360