Characterization of an RF excited broad beam ion source operating with inert gases (vol 129, 223305, 2021)

被引:0
|
作者
Rohkamm, Erik [1 ]
Spemann, Daniel [1 ]
Scholze, Frank [1 ]
Frost, Frank [1 ]
机构
[1] Leibniz Inst Surface Engn IOM, Permoserstr 15, D-04318 Leipzig, Germany
关键词
D O I
10.1063/5.0089145
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页数:1
相关论文
共 24 条
  • [21] On the definition of the deuterium-tritium ion beam parameters for the SORGENTINA-RF fusion neutron source (vol 137, 1150, 2022)
    Fonnesu, Nicola
    Scaglione, Salvatore
    Spassovsky, Ivan Panov
    Zito, Pietro
    Pietropaolo, Antonino
    Agostini, Pietro
    SRF Collaboration, Pietro
    Angiolini, Massimo
    Alberghi, Ciro
    Candido, Luigi
    Capogni, Marco
    Capone, Mauro
    Cataldo, Sebastiano
    Contessa, Gian Marco
    D'Annibale, Francesco
    D'Arienzo, Marco
    Dotto, Alessio Del
    Diamanti, Dario
    Dongiovanni, Danilo
    Farini, Mirko
    Ferrari, Paolo
    Fiore, Angela
    Flammini, Davide
    Frisoni, Manuela
    Gadani, Gianni
    Gentili, Angelo
    Grasso, Giacomo
    Guardati, Manuela
    Guidoni, David
    Lamberti, Marco
    Lepore, Luigi
    Mancini, Andrea
    Mariani, Andrea
    Marinari, Ranieri
    Marzo, Giuseppe A.
    Mastroianni, Bruno
    Moro, Fabio
    Orefice, Agostina
    Orsetti, Valerio
    Pinna, Tonio
    Rizzo, Antonietta
    Rydzy, Alexander
    Salvi, Stefano
    Santoli, Demis
    Santucci, Alessia
    Saraceno, Luca
    Sartorio, Camillo
    Sermenghi, Valerio
    Serra, Emanuele
    Simonetti, Andrea
    EUROPEAN PHYSICAL JOURNAL PLUS, 2022, 137 (12):
  • [22] Characterization of the CW starter plasma RF matching network for operating the SNS H- ion source with lower H2 flows
    Han, B. X.
    Stockli, M. P.
    Kang, Y.
    Piller, C.
    Murray, S. N., Jr.
    Pennisi, T. R.
    Santana, M.
    Welton, R. F.
    REVIEW OF SCIENTIFIC INSTRUMENTS, 2016, 87 (02):
  • [23] Diamond-like carbon films deposited using a broad, uniform ion beam from an RF inductively coupled CH4-plasma source
    Druz, B
    Ostan, E
    Distefano, S
    Hayes, A
    Kanarov, V
    Polyakov, V
    Rukovishnikov, A
    Rossukanyi, N
    Khomich, AV
    DIAMOND AND RELATED MATERIALS, 1998, 7 (07) : 965 - 972
  • [24] Volatile products and endpoint detection in reactive ion etching of III-V compounds with a broad beam ECR source (Reprinted from Nuclear Instruments and Methods in Physics Research B, vol 106, pg 179-182, 1995)
    Melville, DL
    Budinavicius, J
    Thompson, DA
    Simmons, JG
    ION BEAM MODIFICATION OF MATERIALS, 1996, : 179 - 182