Segregation-induced Ge precipitation in Ge2Sb2Te5 and N-doped Ge2Sb2Te5 line cells

被引:5
|
作者
Xu, Qiyun [1 ]
Lian, Enkui [1 ]
Yeoh, Phoebe [2 ]
Skowronski, Marek [1 ]
机构
[1] Carnegie Mellon Univ, Dept Mat Sci & Engn, Pittsburgh, PA 15213 USA
[2] Intel Corp, 2200 Mission Coll Blvd, Santa Clara, CA 95052 USA
基金
美国安德鲁·梅隆基金会;
关键词
PHASE-CHANGE MEMORY; TE;
D O I
10.1063/5.0087570
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electromigration in Ge2Sb2Te5 and N-doped Ge2Sb2Te5 line cell structures has been studied by mapping out electric field/current-induced composition changes using x-ray energy dispersive spectroscopy. Both materials exhibit pronounced segregation in a molten state, with Te moving toward the anode and Ge and Sb toward the cathode. The width of the transition region from a composition of over 90% Te to over 90% Ge-Sb was 500 nm for an electric field of 1.1 x 10(7) V/m. In the Ge-Sb-rich end of the cell, Ge precipitates out of the melt, forming almost pure Ge inclusions with a size up to 100 nm. The Ge-Sb-Te segregation and precipitation do not appear to be affected by doping with nitrogen. (C) 2022 Author(s).
引用
收藏
页数:7
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