Slippage of nonsuperfluid helium films

被引：27
|
作者：
Hieda, M
Nishino, T
Suzuki, M
Wada, N
Torii, K
机构：
[1] Univ Electrocommun, Dept Appl Phys & Chem, Tokyo 1828585, Japan
[2] Univ Tokyo, Grad Sch Arts & Sci, Meguro Ku, Tokyo 1538902, Japan
[3] Tohoku Natl Ind Res Inst, Miyagi Ku, Sendai, Miyagi 9838551, Japan
来源：
PHYSICAL REVIEW LETTERS | 2000年 / 85卷 / 24期
关键词：
D O I：
10.1103/PhysRevLett.85.5142
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We measured the mechanical response of He-3 and He-4 films on an oscillating substrate using an ultrasonic technique. Up to the coverage at which the fluid state appears at absolute zero, a part of the nonsuperfluid He-3 and He-4 films underwent slipping relative to the substrate at low temperatures. From the temperature dependence of the slippage, it was found that a thermally activated process plays an important role in the frictional force of this system.
引用
收藏
页码：5142 / 5145
页数：4
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