The effect of thermal treatment on the structure, optical and electrical properties of amorphous titanium nitride thin films

被引：58
|
作者：
Tarniowy, A
Mania, R
Rekas, M
机构：
[1] R&D Ctr Rubber & Vinyl Plast, PL-32600 Oswiecim, Poland
[2] Stanislaw Staszic Univ Min & Met, Dept Inorgan Chem, PL-30059 Krakow, Poland
[3] Australian Nucl Sci & Technol Org, Div Mat, Lucas Hts Sci & Technol Ctr, Menai, NSW 2234, Australia
来源：
THIN SOLID FILMS | 1997年 / 311卷 / 1-2期
关键词：
titanium nitride; amorphous materials; electrical properties and measurements; optical properties;
D O I：
10.1016/S0040-6090(97)00714-1
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The TiN thin films were deposited by reactive magnetron method. The structure and chemical composition of films were determined by X-ray, EDX and electron microscopy investigations. These studies indicate a complex structure of as-sputtered films. The films are composed of an amorphous matrix that includes nanocrystallites of TiN and Ti2N. The amorphous as-sputtered films transform into crystalline films during thermal treatment above 673 K. Both electrical and optical properties of amorphous films differ substantially from those of crystalline films of the same chemical composition. Amorphous TiN films exhibit high electrical resistivity, high transmission of light in the visible range and a lack of metallic brilliance. The development of the structure models during thermal treatment has been proposed. (C) 1997 Elsevier Science S.A.
引用
收藏
页码：93 / 100
页数：8
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