A procedure to correct for target thickness effects in heavy-ion PIXE at MeV energies

被引：7
|
作者：
Zucchiatti, Alessandro [1 ]
Galan, Patricia [2 ]
Emilio Prieto, Jose [2 ,3 ,4 ]
机构：
[1] Univ Autonoma Madrid, Calle Einstein 3, E-28049 Madrid, Spain
[2] Univ Autonoma Madrid, CMAM, E-28049 Madrid, Spain
[3] Univ Autonoma Madrid, IFIMAC, Dept Fis Mat Condensada, E-28049 Madrid, Spain
[4] Univ Autonoma Madrid, Inst Nicolas Cabrera, E-28049 Madrid, Spain
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2017年 / 407卷
关键词：
Heavy ions; PIXE; Target thickness effects; Correction factors; X-RAY-PRODUCTION; K-SHELL IONIZATION; CROSS-SECTIONS; MEV-SIMS; ELEMENTS; IMPACT; BEAM; FE; NI; CU;
D O I：
10.1016/j.nimb.2017.05.022
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
We describe a novel procedure for the calculation of correction factors for taking into account the effect of target thickness to be applied to the determination of cross sections of X-ray emission induced by heavy ions at MeV energies. We discuss the origin of the correction and describe the calculations, based on simple polynomial fits of both the theoretical cross sections and the ion energy losses. The procedure can be easily implemented. We show several examples for a set of targets specifically produced for cross section measurements and for various combinations of ion type and energy. (C) 2017 Elsevier B.V. All rights reserved.
引用
收藏
页码：1 / 4
页数：4
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