MEV HEAVY-ION MICROPROBE PIXE FOR THE ANALYSIS OF THE MATERIALS SURFACE

被引：4
|
作者：
MOKUNO, Y
HORINO, Y
KINOMURA, A
CHAYAHARA, A
KIUCHI, M
FUJII, K
TAKAI, M
机构：
[1] GOVT IND RES INST,IKEDA,OSAKA 563,JAPAN
[2] OSAKA UNIV,EXTREME MAT RES CTR,TOYONAKA,OSAKA 560,JAPAN
[3] OSAKA UNIV,FAC ENGN SCI,TOYONAKA,OSAKA 560,JAPAN
来源：
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1994年 / 85卷 / 1-4期
关键词：
D O I：
10.1016/0168-583X(94)95914-5
中图分类号：
TH7 [仪器、仪表];
学科分类号：
0804 ; 080401 ; 081102 ;
摘要：
Micro PIXE analysis using MeV phosphorus microprobes was performed to a surface structure which consists of multilevel aluminum wirings in silicon nitride and these results were compared with those from a proton microprobe. In the case of a 2 MeV phosphorus microprobe, the X-ray production was enhanced near the surface due to the large energy deposition rate or the short projectile range. As a result, the increase in surface sensitivity was clearly shown in PIXE mapping images of aluminum, silicon, and phosphorus.
引用
收藏
页码：741 / 743
页数：3
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