Dislocation contrast in cathodoluminescence and electron-beam induced current maps on GaN(0001)

被引:36
|
作者
Sabelfeld, Karl K. [1 ,2 ]
Kaganer, Vladimir M. [3 ]
Pfueller, Carsten [3 ]
Brandt, Oliver [3 ]
机构
[1] Russian Acad Sci, Inst Computat Math & Math Geophys, Novosibirsk 630090, Russia
[2] Novosibirsk State Univ, Lavrentiev Prosp 6, Novosibirsk 630090, Russia
[3] Paul Drude Inst Festkorperelekt, Hausvogteipl 5-7, D-10117 Berlin, Germany
基金
俄罗斯科学基金会;
关键词
cathodoluminescence; EBIC; dislocation; GaN; LIGHT-EMITTING-DIODES; CHARGE-COLLECTION; DIFFUSION LENGTH; THEORETICAL DESCRIPTION; THREADING DISLOCATIONS; LOCALIZED DEFECTS; GAN; SEMICONDUCTOR; SEM; RECOMBINATION;
D O I
10.1088/1361-6463/aa85c8
中图分类号
O59 [应用物理学];
学科分类号
摘要
We theoretically analyze the contrast observed at the outcrop of a threading dislocation at the GaN(0 0 0 1) surface in cathodoluminescence and electron-beam induced current maps. We consider exciton diffusion and recombination including finite recombination velocities both at the planar surface and at the dislocation. Formulating the reciprocity theorem for this general case enables us to provide a rigorous analytical solution of this diffusion-recombination problem. The results of the calculations are applied to an experimental example to determine both the exciton diffusion length and the recombination strength of threading dislocations in a free-standing GaN layer with a dislocation density of 6 x 10(5) cm(-2).
引用
收藏
页数:11
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