Production of polarized electron beam with sub-nanosecond multi-bunch structure from superlattice photocathode

被引:16
|
作者
Togawa, K
Nakanishi, T [1 ]
Baba, T
Furuta, F
Horinaka, H
Kurihara, Y
Matsumoto, H
Matsuyama, T
Nishitani, T
Okumi, S
Omori, T
Suzuki, C
Takeuchi, K
Wada, K
Wada, K
Yamamoto, M
Yoshioka, M
机构
[1] Nagoya Univ, Dept Phys, Nagoya, Aichi 4648602, Japan
[2] NEC Corp Ltd, Fundamental Res Labs, Tsukuba, Ibaraki 3058501, Japan
[3] Univ Osaka Prefecture, Coll Engn, Sakai, Osaka 5998531, Japan
[4] KEK, High Energy Accelerator Res Org, Tsukuba, Ibaraki 3050801, Japan
关键词
D O I
10.1016/S0168-9002(00)00717-8
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Polarized electron beam with sub-nanosecond multi-bunch structure has been first produced from an In-GaAs-AlGaAs strained-layer superlattice photocathode with heavy surface doping. The extracted charge of 0.6 x 10(10)e(-)/bunch is determined by the space charge limit of the 50 keV gun. The multi-bunch effect due to the surface charge limit phenomenon, which is peculiar to a negative electron affinity surface of semiconductor photocathode, is not observed in the second bunch separated by 2.8 ns. We conclude that a superlattice photocathode with a heavily doped surface is the best photocathode for the future linear colliders. (C) 2000 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:118 / 122
页数:5
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