High Throughput Phase Mapping for Metrology Using Low-loss EELS

被引：0

作者：

Fu, Lianfeng ^{[1
]}

Chen, Lifan ^{[1
]}

Wang, Haifeng ^{[1
]}

机构：

[1] Western Digital Corp, 44100 Osgood Rd, Fremont, CA 94539 USA

来源：

ISTFA 2017: CONFERENCE PROCEEDINGS FROM THE 43RD INTERNATIONAL SYMPOSIUM FOR TESTING AND FAILURE ANALYSIS | 2017年

关键词：

D O I：

暂无

中图分类号：

TP3 [计算技术、计算机技术];

学科分类号：

0812 ;

摘要：

The plasmon-loss region of the low-loss electron energy loss spectroscopy (EELS) contains chemical information similar to core-loss EELS; therefore it can be utilized as finger-printing elements. A high throughput phase mapping technique based on plasmon energy (Ep) is proposed. We have successfully applied this phase mapping technique into two case studies in our magnetic head manufacturer processes. This Ep phase mapping can be applied to not only the data storage but also semiconductor industries.

引用

页码：362 / 365

页数：4

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