Composition control of radio-frequency magnetron sputter-deposited La0.5Sr0.5CoO3-partial derivative thin films

被引:23
|
作者
Klenov, DO
Donner, W
Chen, L
Jacobson, AJ
Stemmer, S [1 ]
机构
[1] Univ Calif Santa Barbara, Dept Mat, Santa Barbara, CA 93106 USA
[2] Univ Houston, Dept Phys, Houston, TX 77204 USA
[3] Univ Houston, Dept Chem, Houston, TX 77204 USA
关键词
D O I
10.1557/JMR.2003.0026
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
For this paper, we used radio-frequency (rf) sputter deposition to synthesize epitaxial La0.5Sr0.5CoO3-partial derivative (LSCO) films. We investigated the influence of sputter deposition parameters, in particular, oxygen partial pressure, plasma power, total sputter pressure, and post-deposition cooling atmosphere on film composition, microstructure, and electrical resistivity. We show that rf sputtering from a single target can produce LSCO films with La/Sr and (La + Sr)/Co ratios of unity and with low electrical resistivities of about 1 mOmega cm. Film microstructures were characterized by high-resolution transmission electron microscopy and x-ray diffraction. Formation of an ordered film superlattice, most likely due to oxygen vacancy ordering, was observed. In this paper, we discuss the relationship between the film microstructure and the electrical resistivity.
引用
收藏
页码:188 / 194
页数:7
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