Surface states of hydrogen-terminated Si(111) by metastable atom electron spectroscopy and angle-resolved ultraviolet photoelectron spectroscopy

被引:8
|
作者
Yasufuku, H [1 ]
Meguro, K
Akatsuka, S
Setoyama, H
Kera, S
Azuma, Y
Okudaira, KK
Hasegawa, S
Harada, Y
Ueno, N
机构
[1] Chiba Univ, Grad Sch Sci & Technol, Inage Ku, Chiba 2638522, Japan
[2] Chiba Univ, Fac Engn, Dept Mat Technol, Inage Ku, Chiba 2638522, Japan
[3] Chiba Univ, Ctr Frontier Sci, Inage Ku, Chiba 2638522, Japan
[4] Inst Mol Sci, Okazaki, Aichi 4448585, Japan
[5] Seitoku Univ, Life Culture Dept, Matsudo, Chiba 2718555, Japan
关键词
hydrogen-terminated Si(111); surface state; MAES; ARUPS; synchrotron radiation; electron spectroscopy;
D O I
10.1143/JJAP.39.1706
中图分类号
O59 [应用物理学];
学科分类号
摘要
The surface electronic states of hydrogen-terminated Si(111) [H-Si(111)-(1 x 1)] were studied by metastable atom electron spectroscopy (MAES) and angle-resolved ultraviolet photoelectron spectroscopy (ARUPS), coupled with an intensity analysis used for organic systems. The surface states of H-Si(111)-(1 x 1) originated from Si-H bonds were selectively observed by MAES which can excite electrons distributed at the outermost surface. Furthermore, the prominent ARUPS peak with very small dispersion at around 10eV binding energy from the vacuum level was confirmed to originate from a nondispersive Si-H sigma state by quantitative analysis of the photoelectron angular distribution using a simple computation model used for organic thin films.
引用
收藏
页码:1706 / 1709
页数:4
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