Partial sulfurization of laser-ablated titanium oxide film for the improvement in photocatalytic property

Photocatalytic titanium oxide (TiO2) thin films were prepared on quartz substrate by the pulsed laser deposition using Nd:YAG (lambda = 1.064 mum) pulse laser. Subsequently, the films were sulfurized in H2S or CS2 atmosphere under various conditions. After the sulfurization of the film in H2S or CS2 at 1273 K for I h, the surface morphology and structure of the deposited TiO2 film were changed. The photocatalytic property of the film might be improved by the sulfurization using CS2 at the temperatures lower than 1273 K.