High resolution deep UV laser mask repair based on near-field optical technology

被引：5
|
作者：
Lieberman, K [1 ]
Terkel, H [1 ]
Rudman, M [1 ]
Ignatov, A [1 ]
Lewis, A [1 ]
机构：
[1] NANON LITHOG LTD,IL-91487 MALHA JERUSALEM,ISRAEL
来源：
PHOTOMASK AND X-RAY MASK TECHNOLOGY III | 1996年 / 2793卷
关键词：
D O I：
10.1117/12.245238
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
引用
收藏
页码：481 / 488
页数：8
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