Crystalline structure defects and strength of Si and Ge

被引:0
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作者
Dotsenko, JP
Ermakov, VM
Kolomoets, VV
Machulin, VF
Venger, EF
Prokopenko, IV
Ponomarjev, NM
Suss, BA
机构
[1] Natl Acad Sci Ukraine, Inst Semicond Phys, UA-252650 Kiev 28, Ukraine
[2] Inst Rare Met, Moscow 109017, Russia
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中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The transport phenomena and mechanical strength of monocrystalline Si and Ge were investigated at extremely high uniaxial stress. The low temperature plasticity was studied by the conductivity recording and the metallographic method. It was established that the real mechanical strength of Si and Ge crystals was substantially lower than a theoretical one and it is determined by the presence of different crystalline structure defects caused by the growth conditions.
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页码:281 / 284
页数:4
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