Structural and magnetic properties of GaN:Sm:Eu films fabricated by co-implantation method

被引:3
|
作者
Sun, Lili [1 ]
Liu, Chao [1 ]
Li, Jianming [1 ]
Wang, Junxi [1 ]
Yan, Fawang [1 ]
Zeng, Yiping [1 ]
Li, Jinmin [1 ]
机构
[1] Chinese Acad Sci, Inst Semicond, Beijing 100083, Peoples R China
关键词
Magnetic materials; Semiconductors; Ion implantation; GAN; ER;
D O I
10.1016/j.matlet.2010.01.087
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Diluted-magnetic GaN:Sm:Eu films have been fabricated by co-implantation of Sm and Eu ions into c-plane (0001) GaN films and a subsequent annealing process. The structural, morphological and magnetic characteristics of the samples have been investigated by means of high-resolution X-ray diffraction (HRXRD), atomic force microscopy (AFM), and superconducting quantum interference device (SQUID). The XRD and AFM analyses show that the annealing process can effectively recover the crystalline degradation caused by implantation. Compared with GaN:Sm films, more defects have been introduced into GaN:Sm:Eu films due to the Eu implantation process. According to the SQUID analysis, GaN:Sm:Eu films exhibit clear room-temperature ferromagnetism. Moreover, GaN:Sm:Eu films show a lower saturation magnetization (Ms) than GaN:Sm films. (C) 2010 Elsevier B.V. All rights reserved.
引用
收藏
页码:1031 / 1033
页数:3
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