Utilisation of Near Field Microscopy for Nanoscopic Analysis of Magnetic Domain Orientation

被引：0

作者：

Ozimek, Mariusz ^{[1
,3
]}

Sikora, Andrzej ^{[2
]}

Gaworska-Koniarek, Dominika ^{[2
]}

Wilczynski, Wieslaw ^{[2
]}

机构：

[1] Inst Elektrotech, Zaklad Mat & Diagnostyki, Oddzial Wroclaw, PL-50369 Warsaw, Poland

[2] Inst Elektrotech, PL-04703 Warsaw, Poland

[3] Wroclaw Univ Technol, Wroclaw, Poland

来源：

PRZEGLAD ELEKTROTECHNICZNY | 2010年 / 86卷 / 04期

关键词：

magnetic force microscopy; magnetic domains; thin films Ni-Fe; magnetron sputtering; ATOMIC-FORCE MICROSCOPY; FILMS; MICROSTRUCTURE; MFM;

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

NiFe thin films deposited onto Si substrate at room temperature via impulse magnetron sputtering. Magnetron deposition was carried out in sputtering power 550 W and different argon pressure (0.4, 1.0, 4.0 Pa). The ferromagnetic layers thicknesses were 80, 150 and 120 nm respectively. The samples were characterized by X-Ray diffraction. Effect of sputtering parameters on domain structure, as explored by magnetic force microscopy (MFM), was focused. The investigation showed a variety of magnetic domain microstructures (Utilisation of Near Field Microscopy for Nanoscopic Analysis of Magnetic Domain Orientation).

引用

页码：72 / 74

页数：3

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