Utilisation of Near Field Microscopy for Nanoscopic Analysis of Magnetic Domain Orientation

被引：0
|
作者：
Ozimek, Mariusz [1 ,3 ]
Sikora, Andrzej [2 ]
Gaworska-Koniarek, Dominika [2 ]
Wilczynski, Wieslaw [2 ]
机构：
[1] Inst Elektrotech, Zaklad Mat & Diagnostyki, Oddzial Wroclaw, PL-50369 Warsaw, Poland
[2] Inst Elektrotech, PL-04703 Warsaw, Poland
[3] Wroclaw Univ Technol, Wroclaw, Poland
来源：
PRZEGLAD ELEKTROTECHNICZNY | 2010年 / 86卷 / 04期
关键词：
magnetic force microscopy; magnetic domains; thin films Ni-Fe; magnetron sputtering; ATOMIC-FORCE MICROSCOPY; FILMS; MICROSTRUCTURE; MFM;
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
NiFe thin films deposited onto Si substrate at room temperature via impulse magnetron sputtering. Magnetron deposition was carried out in sputtering power 550 W and different argon pressure (0.4, 1.0, 4.0 Pa). The ferromagnetic layers thicknesses were 80, 150 and 120 nm respectively. The samples were characterized by X-Ray diffraction. Effect of sputtering parameters on domain structure, as explored by magnetic force microscopy (MFM), was focused. The investigation showed a variety of magnetic domain microstructures (Utilisation of Near Field Microscopy for Nanoscopic Analysis of Magnetic Domain Orientation).
引用
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页码：72 / 74
页数：3
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