GaAs pyramidal microtips grown by selective liquid-phase epitaxy

被引:5
|
作者
Hu, LZ [1 ]
Zhang, HZ [1 ]
Wang, ZJ [1 ]
Sun, J [1 ]
Zhao, Y [1 ]
Liang, XP [1 ]
机构
[1] Dalian Univ Technol, Dept Phys, Dalian 116023, Peoples R China
基金
中国国家自然科学基金;
关键词
scanning electron microscopy; liquid phase epitaxy; selective epitaxy; semiconducting gallium arsenide;
D O I
10.1016/j.jcrysgro.2004.07.078
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
We present a simple selective liquid-phase epitaxial growth of GaAs pyramidal microtips for integrated scanning near-field optical microscopy sensors. The technique comprises oxide mask formation, openings creation, and liquidphase epitaxial growth. SiO2 mask is firstly formed on (0 0 1) GaAs substrate by liquid-phase deposition, periodic square windows are then created in the mask using photolithography and wet etching, and GaAs microtips are finally grown on the opening areas by liquid-phase epitaxy. Scanning electron microscopy images show high quality of the pyramidal microtips bounded by four equal {111} sidewalk. This differs greatly from those drawn from selective metalorganic chemical vapor deposition. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:46 / 49
页数:4
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