Angle-resolved photoelectron spectroscopy study of initial stage of thermal oxidation on 4H-SiC(0001)

被引:5
|
作者
Arai, Hitoshi [1 ]
Nohira, Hiroshi [1 ,2 ]
机构
[1] Tokyo City Univ, Grad Sch Engn, Dept Elect & Engn, Setagaya Ku, Tokyo 1588557, Japan
[2] Tokyo City Univ, Dept Elect & Elect Engn, Fac Engn, Setagaya Ku, Tokyo 1588557, Japan
关键词
CARBIDE INTERFACE;
D O I
10.7567/JJAP.55.04EB04
中图分类号
O59 [应用物理学];
学科分类号
摘要
A key to improving the performance of SiC MOSFETs is to clarify the SiO2/SiC interface structure formed by thermal oxidation. We have investigated the initial stage of thermal oxidation on 4H-SiC(0001) by angle-resolved photoelectron spectroscopy. From the changes in the Si 2p(3/2) and C 1s photoelectron spectra, the changes in the chemical bonding state of the SiO2/SiC structure with the progress of thermal oxidation were observed. We also found that the intensity of C-O bonds in the case of 4H-SiC(0001) was smaller than that in the case of 4H-SiC(0001) with the same oxide thickness and that the oxidation rate of 4H-SiC(0001) is already slower than that of 4H-SiC(0001) in the early stage of oxidation. (C) 2016 The Japan Society of Applied Physics
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页数:5
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