Thermally poled silicate thin films with large second-harmonic generation

被引：10
|
作者：
Sugihara, O [1 ]
Nakanishi, M [1 ]
Fujimura, H [1 ]
Egami, C [1 ]
Okamoto, N [1 ]
机构：
[1] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 432, Japan
来源：
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 1998年 / 15卷 / 01期
关键词：
D O I：
10.1364/JOSAB.15.000421
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices. (C) 1998 Optical Society of America.
引用
收藏
页码：421 / 425
页数：5
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