Thermally poled silicate thin films with large second-harmonic generation

被引：10

作者：

Sugihara, O ^{[1
]}

Nakanishi, M ^{[1
]}

Fujimura, H ^{[1
]}

Egami, C ^{[1
]}

Okamoto, N ^{[1
]}

机构：

[1] Shizuoka Univ, Fac Engn, Hamamatsu, Shizuoka 432, Japan

来源：

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS | 1998年 / 15卷 / 01期

关键词：

D O I：

10.1364/JOSAB.15.000421

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Ge- and Ti-doped silica thin films were prepared upon various substrates by solgel processing and rf sputtering. Large second-harmonic generation was measured from thermally poled thin-film samples. The origin of nonlinearity and its distribution from thermally poled silicate thin films were investigated. Moreover, we measured the stability of the nonlinearity of a rf-sputtered germanosilicate thin film upon a silica glass substrate against heat and intense laser light sufficient for the fabrication of waveguide-type nonlinear optical devices. (C) 1998 Optical Society of America.

引用

页码：421 / 425

页数：5

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