Growth kinetics and formation of uniform self-assembled InAs/GaAs quantum dots at

被引:0
|
作者
Kim, Eui-Tae [1 ]
Madhukar, Anupam [2 ]
机构
[1] Chungnam Natl Univ, Div Nanoengn, 220 Gung Dong, Taejon, South Korea
[2] Univ Southern Calif, Dept Mat Sci & Phys, Los Angeles, CA 90089 USA
关键词
InAs/GaAs; self-assembled quantum dots; molecular beam epitaxy;
D O I
10.4028/www.scientific.net/SSP.124-126.539
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
We discuss the growth kinetics of InAs/GaAs self-assembled quantum dots (QDs) using two different InAs deposition rates, relatively fast growth rate of 0.22 ML/sec and slow growth rate of 0.054 ML/sec. With increasing InAs deposition amount to 3.0 ML, the QD density was almost constant after 2D to 3D island transition at the slow deposition rate while the QD density kept increasing and the QD size distribution was relatively broad at the fast growth rate. After the 2D to 3D transition, at the slow growth rate, further deposited In adatoms seemed to incorporate primarily into already formed islands, and thus contribute to equalize island size. The photo luminescence (PL) full-width at half maximum (FWHM) of 2.5 ML InAs QDs at 0.054 ML/sec was 23 meV at 78K. The PL characteristics of InAs/GaAs QDs were degraded significantly after thermal annealing at 550 T for 3 hours.
引用
收藏
页码:539 / +
页数:2
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