Ni diffusion in near-equiatomic Ni-Ti and Ni-Ti(-Cu) alloys

被引:0
|
作者
Bernardini, J [1 ]
Lexcellent, C
Daróczi, L
Beke, DL
机构
[1] Fac Sci & Tech St Jerome, CNRS, Unite Mixte Rech, Lab Materiaux & Microelect Provence, F-13397 Marseille 20, France
[2] Univ Franche Comte, Lab Mechan Appl Raymond Chaleat, CNRS, UMR 6604, F-25000 Besancon, France
[3] Univ Debrecen, Fac Sci, Dept Solid State Phys, H-4010 Debrecen, Hungary
关键词
D O I
10.1080/0141861021021000036656
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tracer volume diffusion of Ni-63 in Ni-50.07 at.% Ti binary and Ni-48.83 at.% Ti-9.29 at.% Cu ternary alloys have been measured between 783 and 1288 K. The temperature dependence of the diffusion coefficients can be well described by a straight Arrhenius function D =(1.8(-0.9)(+2.0)) x 10(-8) exp(155 +/- 6 kJ mol(-1)/RT) m(2) s(-1). This illustrates that a diffusional anomaly (typical in some bcc metallic alloys and related to the well-known phonon softening), if there is any in this system, is negligible. On the other hand, the small activation energy (about half the value expected from simulations for the commonly accepted mechanism with thermally activated vacancies) shows that the mechanism of diffusion is probably mediated by structural vacancies.
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页码:329 / 338
页数:10
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