Effects of sonic and ultrasonic scaling on the surface roughness of tooth-colored restorative materials for cervical lesions

被引:20
|
作者
Lai, Y. L.
Lin, Y. C.
Chang, C. S.
Lee, S. Y.
机构
[1] Taipei Vet Gen Hosp, Dept Periodontol, Taipei, Taiwan
[2] Taipei Vet Gen Hosp, Dept Dent, Taipei, Taiwan
[3] Natl Yang Ming Univ, Dept Restorat Dent, Sch Dent, Taipei 112, Taiwan
基金
美国国家科学基金会;
关键词
D O I
10.2341/06-77
中图分类号
R78 [口腔科学];
学科分类号
1003 ;
摘要
This study investigated the effects of sonic and ultrasonic scaling on the surface roughness of five commonly used tooth-colored restorative materials for Class V cavities, including a flowable resin composite (Tetric Flow), a compomer (Compoglass F), a glass ionomer (Fuji II), a resin-modified glass ionomer (Fuji II LC Imp) and a resin composite (Z100). Twenty rectangular block specimens (16 x 6 x 1.5 mm) of each mate rial were cured against matrix strips, then stored in artificial saliva for two months before performing the periodontal instrumentation. Each specimen was divided into two experimental zones, and both scaling treatments were performed on each sample. The surface roughness (Ra) of these materials was determined before and after the different instrumentations, and differences were evaluated with the use of a profilometer. Data were statistically analyzed using repeated measures of ANOVA with Tukey's multiple comparisons and paired t-tests at a significance level of 0.05. Significant increases in surface roughness of all test materials were recorded from both scaling treatments. With the exception of Tetric Flow, ultrasonic scaling had more adverse effects on the surface roughness of all test materials compared to sonic scaling. For the test materials Z100 and Tetric Flow, resin composites showed the least surface changes in both scaling treatments, while Fuji II glass ionomer demonstrated the greatest roughness after instrumentation. More importantly, the mean surface roughness values of several materials after instrumentation were above the critical threshold roughness of 0.2 mu m.
引用
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页码:273 / 278
页数:6
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