CF4 decomposition using inductively coupled plasma:: Effect of power frequency

被引:24
|
作者
Kuroki, T [1 ]
Mine, J
Okubo, M
Yamamoto, T
Saeki, N
机构
[1] Osaka Prefecture Univ, Dept Energy Syst Engn, Sakai, Osaka 5998531, Japan
[2] Pearl Kogyo Co Ltd, Osaka 5590015, Japan
关键词
CF4; decomposition; inductively coupled plasma (ICP); perfluorocompounds (PFCs); power frequency;
D O I
10.1109/TIA.2004.840948
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The performance evaluation of CF4 decomposition efficiency using 2- and 4-MHz power supplies was carried out as a function of the power, the pressure, the flow rate, and the quantity of O-2 addition. When the 2- and 4-MHz power supplies were used, almost complete CF4 removal was achieved at 2.0 and 3.0 kW, respectively, when the CF4 flow rate was 0.20 normal liters per minute. The optimum O-2/CF4 ratio should be in the range of 1.0 similar to 1.25 in order to decompose CF4 efficiently. The CF4 decomposition efficiency using the 2-MHz power supply was significantly higher than that of the 4-MHz power supply under the same power, pressure, and flow rate. Significant amounts of byproducts such as COF2 and CO were identified by the Fourier Transform Infrared Spectrophotometer analysis in addition to CO2.
引用
收藏
页码:215 / 220
页数:6
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