Atomic deuteration of epitaxial many-layer graphene on 4H-SiC(0001)

被引:3
|
作者
Mazza, Alessandro R. [1 ]
Miettinen, Anna [2 ]
Conrad, Matt [2 ]
Charlton, Timothy R. [3 ]
He, Xiaoqing [4 ,5 ]
Guha, Suchi [1 ]
Bian, Guang [1 ]
Lin, Jian [5 ]
Conrad, Edward H. [2 ]
Miceli, Paul F. [1 ]
机构
[1] Univ Missouri, Dept Phys & Astron, Columbia, MO 65211 USA
[2] Georgia Inst Technol, Sch Phys, Atlanta, GA 30332 USA
[3] Oak Ridge Natl Lab, Spallat Neutron Source, Oak Ridge, TN 37830 USA
[4] Univ Missouri, Electron Microscopy Core, Columbia, MO 65211 USA
[5] Univ Missouri, Dept Mech & Aerosp Engn, Columbia, MO 65211 USA
来源
基金
美国国家科学基金会;
关键词
CONFINEMENT; SCATTERING;
D O I
10.1116/1.5095961
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
From studies of single-layer graphene, the authors find that atomic deuteration indeed does lead to reversible chemisorption. However, they find that atomic deuterium treatment of many-layer epitaxially grown graphene on C-face 4H-SiC only affects the surface graphene layer and the buried graphene/SiC interface. Raman and x-ray diffraction experiments reveal that only a small portion of the graphene is affected, showing no interlayer incorporation of deuterium. However, x-ray reflectivity and cross-sectional transmission electron microscopy demonstrate a change of the buried graphene/SiC interface, which resembles a delamination of graphene from the substrate. In some cases, multiple atomic treatments lead to complete delamination of the graphene film. Published by the AVS.
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页数:5
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