Real-time in situ x-ray diffraction as a method to control epitaxial growth

被引:3
|
作者
Bader, AS [1 ]
Faschinger, W
Schumacher, C
Geurts, J
Molenkamp, LW
Neder, RB
Karczewski, G
机构
[1] Univ Wurzburg, Inst Phys, D-97074 Wurzburg, Germany
[2] Univ Wurzburg, Inst Mineral, D-97074 Wurzburg, Germany
[3] Polish Acad Sci, Warsaw, Poland
关键词
D O I
10.1063/1.1582360
中图分类号
O59 [应用物理学];
学科分类号
摘要
We developed a real-time in situ x-ray Bragg diffraction technique for monitoring epitaxial growth. In our setup, the x-ray diffraction requirement of an extremely exact sample adjustment and an angular scan of sample and detector are circumvented by using a slightly divergent x-ray beam and observing an extremely asymmetric Bragg reflection with a multichannel detector. The angular range covered by the stationary multichannel detector corresponds nearly exactly to the q(z) interval of a conventional omega-2theta scan. The technique is demonstrated by monitoring the molecular-beam epitaxial growth of a ZnSe epilayer on (001)GaAs. The exposure time of each diffraction pattern is only a few seconds, which enables a real-time x-ray diffraction monitoring of the epitaxial growth process. (C) 2003 American Institute of Physics.
引用
收藏
页码:4684 / 4686
页数:3
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