Laser micromachining of optical materials with a 157nm fluorine laser

被引：7
|
作者：
Greuters, J [1 ]
Rizvi, NH [1 ]
机构：
[1] Exitech Ltd, Oxford OX5 1QU, England
来源：
LASER MICROMACHINING FOR OPTOELECTRONIC DEVICE FABRICATION | 2003年 / 4941卷
关键词：
157nm laser; F-2 laser micromachining; photonics devices; silica; lithium niobate; indium phosphide;
D O I：
10.1117/12.468234
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Vacuum UV laser micromachining is used to produce rnicrostructures; in common photonics materials. The ablation etch rates of lithium niobate, fused silica and indium phosphide are measured at 157nm and angled facets and v-grooves are machined into the materials using a high NA mask projection system. The applicability of such micromachined structures for photonics devices is discussed and future developments outlined.
引用
收藏
页码：77 / 83
页数：7
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