Research on Metal Lift-Off in Fabrication of a Vertical Cavity Surface Emitting Laser

被引：0

作者：

Li Hongyu ^{[1
]}

Hao Yongqin ^{[1
]}

Shi Baohua ^{[1
]}

Zhang Jiabin ^{[1
]}

Li Yang ^{[1
]}

Feng Yuan ^{[1
]}

Wang Yong ^{[1
]}

Yan Changling ^{[1
]}

Liu Guojun ^{[1
]}

机构：

[1] CUST, Natl Key Lab High Power Semicond Laser, Changchun 130022, Peoples R China

来源：

2015 INTERNATIONAL CONFERENCE ON OPTOELECTRONICS AND MICROELECTRONICS (ICOM) | 2015年

关键词：

metal lift-off; lithography; inverse image; vertical cavity surface emitting laser (VCSEL);

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Metal lift-off in fabrication of P-type electrode of a VCSEL is presented. The lithography patterns directly affect the result of metal lift-off, so the effect of AZ5214 as positive and negative photoresist on metal lift-off is investigated, and the influence factors, such as exposure time, baking temperature and time, are studied in detail. Adopting AZ5214 negative process and optimizing process parameters, an inverse image with angle of 70 degrees is obtained. Finally, perfect P-type electrode of a VCSEL is fabricated. The results show that AZ5214 negative process is a good choice for metal lift-off, especially suitable for metal lift-off in fabrication of a VCSEL with a small aperture.

引用

页码：379 / 382

页数：4

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