Solarization of glass substrates during thin-film deposition

被引:5
|
作者
Escoubas, L [1 ]
Gatto, A [1 ]
Albrand, G [1 ]
Roche, P [1 ]
Commandre, M [1 ]
机构
[1] Ecole Natl Super Phys Marseille, Lab Opt Surfaces & Couches Minces, CNRS 6080, F-13397 Marseille 20, France
来源
APPLIED OPTICS | 1998年 / 37卷 / 10期
关键词
D O I
10.1364/AO.37.001883
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
We demonstrate that solarization occurs in glass substrates during thin-film deposition and that it induces high absorption near the surface of the substrate. Solarization has been observed especially in ion-plating deposition. We show that the solarization of the substrate is caused by electromagnetic radiation emitted from the material to be evaporated. The radiation is due to the energy losses of the heating beam of electrons (bremsstrahlung radiation). Multicomponent glasses such as BK7 are much more sensitive to solarization than fused-silica substrates. The photoinduced high absorption can be partially reversed by thermal annealing. (C) 1998 Optical Society of America.
引用
收藏
页码:1883 / 1889
页数:7
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