The history and potential of maskless e-beam lithography

被引：0
|
作者：
Pfeiffer, HC [1 ]
机构：
[1] HCP Consulting, Monterey, CA 93940 USA
来源：
MICROLITHOGRAPHY WORLD | 2005年 / 14卷 / 01期
关键词：
D O I：
暂无
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
引用
收藏
页码：4 / +
页数：4
相关论文
共 50 条
  • [31] THIN METALLIC LAYERS STRUCTURED BY E-BEAM LITHOGRAPHY
    Horacek, Miroslav
    Kolarik, Vladimir
    Urbanek, Michal
    Matejka, Frantisek
    Matejka, Milan
    21ST INTERNATIONAL CONFERENCE ON METALLURGY AND MATERIALS (METAL 2012), 2012, : 993 - 997
  • [32] Correction Algorithm for the Proximity Effect in e-beam Lithography
    Zarate, Juan Jose
    Pastoriza, Hernan
    2008 ARGENTINE SCHOOL OF MICRO-NANOELECTRONICS, TECHNOLOGY AND APPLICATIONS, 2008, : 38 - 42
  • [33] Relativistic focus condition for e-beam projection lithography
    Kim, JI
    Wei, Y
    Park, GS
    Kim, DW
    Yoo, IK
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2004, 43 (12): : 8044 - 8047
  • [34] E-BEAM EXPOSURE FOR SEMICONDUCTOR-DEVICE LITHOGRAPHY
    WEBER, EV
    MOORE, RD
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1978, 25 (11) : 1339 - 1339
  • [35] Combined e-beam lithography using different energies
    Kratky, Stanislav
    Kolarik, Vladimir
    Horacek, Miroslav
    Meluzin, Petr
    Kral, Stanislav
    MICROELECTRONIC ENGINEERING, 2017, 177 : 30 - 34
  • [36] Towards large area simulation of E-beam lithography
    Bohn, M
    Hofmann, U
    Hoppe, W
    Progler, C
    Ryzhoukhin, M
    23RD ANNUAL BACUS SYMPOSIUM ON PHOTOMASK TECHNOLOGY, PTS 1 AND 2, 2003, 5256 : 695 - 700
  • [37] An electronic image adjustment device for e-beam lithography
    Waskiewicz, WK
    CHARGED-PARTICLE OPTICS II, 1996, 2858 : 156 - 165
  • [38] Direct Patterning of Ionic Polymers with E-Beam Lithography
    Annina M. Steinbach
    Stefan Jenisch
    Parisa Bakhtiarpour
    Masoud Amirkhani
    Steffen Strehle
    MRS Advances, 2016, 1 (1) : 45 - 50
  • [39] Alignment Strategy for Mixed E-Beam and Optical Lithography
    Duval, Paul
    Tabatabaie-Alavi, Kamal
    Shaw, Dale
    St Germain, Alan
    ALTERNATIVE LITHOGRAPHIC TECHNOLOGIES V, 2013, 8680
  • [40] Development of a next generation e-beam lithography system
    Nakagawa, Y
    Komagata, T
    Takemura, H
    Gotoh, N
    Tanaka, K
    18TH ANNUAL SYMPOSIUM ON PHOTOMASK TECHNOLOGY AND MANAGEMENT, 1998, 3546 : 45 - 54
12345