Energy shifts of Si oxidation states in the system of Si nanocrystals embedded in SiO2 matrix

被引:1
|
作者
Chen, T. P. [1 ]
Liu, Y.
Sun, C. Q.
Tseng, Ampere A.
Fung, S.
机构
[1] Nanyang Technol Univ, Sch Elect & Elect Engn, Singapore 639798, Singapore
[2] Arizona State Univ, Ctr Solid State Elect, Dept Mach & Aerosp Engn, Tempe, AZ 85287 USA
[3] Univ Hong Kong, Dept Phys, Hong Kong, Hong Kong, Peoples R China
关键词
Si nanocrystal; X-ray photoemission; core-level;
D O I
10.1166/jnn.2007.434
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Energy shifts in the Si.2p levels of the five Si oxidation states Sin+ (n = 0, 1, 2, 3, 4) in the system of Si nanocrystals embedded in SiO2 matrix have been determined. The thermal annealing effect on the energy shifts has been studied. The result suggests that the Si nanocrystals and the SiO2 are thermally stable but the annealing can cause some structural deformations such as changes in the bond lengths and bond angles for the suboxides Si2O and SiO. The energy shifts generally show a linear dependence on the oxidation state n, suggesting that the energy shifts could be mainly determined by the nearest-neighbor oxygen atoms. It is shown that the chemical structures of the system are similar to those of the conventional SiO2/Si system in terms of the energy shifts.
引用
收藏
页码:2506 / 2510
页数:5
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