Persistence of the gyroid morphology at strong segregation in diblock copolymers

被引：47
|
作者：
Davidock, DA
Hillmyer, MA [1 ]
Lodge, TP
机构：
[1] Univ Minnesota, Dept Chem, Minneapolis, MN 55455 USA
[2] Univ Minnesota, Dept Chem Engn & Mat Sci, Minneapolis, MN 55455 USA
来源：
MACROMOLECULES | 2003年 / 36卷 / 13期
关键词：
D O I：
10.1021/ma034364y
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
引用
收藏
页码：4682 / 4685
页数：4
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