Influence of oxygen on the formation of cubic boron nitride by r.f. magnetron sputtering

被引:1
|
作者
Qi, Gang [1 ]
Le, Yong-Kang [1 ]
机构
[1] Fudan Univ, Dept Phys, Surface Phys Lab, Shanghai 200433, Peoples R China
关键词
Cubic boron nitride; Influence of oxygen; Film composition; CBN FILMS; C-BN; GROWTH; COATINGS; STRESS; DEPOSITION; QUALITY; THICK;
D O I
10.1016/j.apsusc.2009.12.014
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
Formation of cubic boron nitride by r.f. magnetron sputtering has been studied with O-2 addition to the common working gas Ar/N-2. The chemical and the phase composition were determined with Auger electron spectroscopy sputter depth profiling and Fourier transform infrared spectroscopy. The result shows that oxygen hinders the formation of cBN in sufficient nitrogen-supply, but facilitates the growth of cBN in insufficient nitrogen-supply. With insufficient nitrogen-supply, there exists an optimal oxygen-supply in the working gas that promoted the establishment of the stoichiometric condition in the growing film. O-concentration in the film increases with oxygen-supply in the working gas. cBN forms only when the oxygen concentration is below 5% and c(N)/c(B) (ratio of concentration of nitrogen atoms and boron atoms) is 1 in the film. (C) 2009 Elsevier B. V. All rights reserved.
引用
收藏
页码:3249 / 3252
页数:4
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