Effect of silica overlayers on laser damage of HfO2-SiO2 56 degrees incidence high reflectors

被引:14
|
作者
Walton, CC [1 ]
Genin, FY [1 ]
Chow, R [1 ]
Kozlowski, MR [1 ]
Loomis, GE [1 ]
Pierce, E [1 ]
机构
[1] LAWRENCE LIVERMORE NATL LAB, LIVERMORE, CA 94550 USA
关键词
D O I
10.1117/12.240406
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
引用
收藏
页码:550 / 559
页数:10
相关论文
共 50 条
  • [1] Laser Induced Damage Threshold Studies of HfO2-SiO2 Composite Thin Films
    Tokas, R. B.
    Kamble, N. M.
    Jena, S.
    Thakur, S.
    Poswal, A. K.
    Sahoo, N. K.
    INDIAN VACUUM SOCIETY SYMPOSIUM ON THIN FILMS: SCIENCE & TECHNOLOGY, 2012, 1451 : 76 - 78
  • [2] Effect of λ/2 silica overcoat on laser damage of HfO2/SiO2 high reflecting coating
    Hu, J.P.
    Qiu, F.M.
    Fu, X.Y.
    Zeng, X.
    2001, Editorial Office of High Power Laser and Particle Beams (13):
  • [3] Optical properties and laser damage threshold of HfO2-SiO2 mixed composite thin films
    Jena, Shuvendu
    Tokas, Raj Bahadur
    Kamble, Nitin M.
    Thakur, Sudhakar
    Sahoo, Naba Kishore
    APPLIED OPTICS, 2014, 53 (05) : 850 - 860
  • [4] Comparison of femtosecond and nanosecond laser-induced damage in HfO2 single-layer film and HfO2-SiO2 high reflector
    Yuan, Lei
    Zhao, Yuanan
    Shang, Guangqiang
    Wang, Chengren
    He, Hongbo
    Shao, Jianda
    Fan, Zhengxiu
    JOURNAL OF THE OPTICAL SOCIETY OF AMERICA B-OPTICAL PHYSICS, 2007, 24 (03) : 538 - 543
  • [5] Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors
    Cheng, Xinbin
    Shen, Zhengxiang
    Jiao, Hongfei
    Zhang, Jinlong
    Ma, Bin
    Ding, Tao
    Lu, Jiangtao
    Wang, Xiaodong
    Wang, Zhanshan
    APPLIED OPTICS, 2011, 50 (09) : C357 - C363
  • [6] Using monodisperse SiO2 microspheres to study laser-induced damage of nodules in HfO2/SiO2 high reflectors
    Cheng, Xinbin
    Ding, Tao
    He, Wenyan
    Zhang, Jinlong
    Jiao, Hongfei
    Ma, Bin
    Shen, Zhengxiang
    Wang, Zhanshan
    ADVANCES IN OPTICAL THIN FILMS IV, 2011, 8168
  • [7] High temperature annealing effects on spectral, microstructural and laser damage resistance properties of sputtered HfO2 and HfO2-SiO2 mixture-based UV mirrors
    Abromavicius, Giedrius
    Kicas, Simonas
    Buzelis, Rytis
    OPTICAL MATERIALS, 2019, 95
  • [8] Preparation of SiO2/HfO2 high reflectors
    Key Laboratory of Advanced Micro-Structure Materials, Department of Physics, Tongji University, Shanghai 200092, China
    不详
    Qiangjiguang Yu Lizishu, 2012, 6 (1276-1280):
  • [9] Growth of laser-induced damage during repetitive illumination of HfO2-SiO2 multilayer mirror and polarizer coatings
    Genin, FY
    Stolz, CJ
    Kozlowski, MR
    LASER-INDUCED DAMAGE IN OPTICAL MATERIALS: 1996, 1997, 2966 : 273 - 282
  • [10] Influence of composition and seed dimension on the structure and laser damage of nodular defects in HfO2/SiO2 high reflectors
    Wei, Chaoyang
    Yi, Kui
    Fan, Zhengxiu
    Shao, Jianda
    APPLIED OPTICS, 2012, 51 (28) : 6781 - 6788