Laser damage study of nodules in electron-beam-evaporated HfO2/SiO2 high reflectors

被引：48
|
作者：
Cheng, Xinbin [1 ,2 ]
Shen, Zhengxiang [1 ,2 ]
Jiao, Hongfei [1 ,2 ,3 ]
Zhang, Jinlong [1 ,2 ]
Ma, Bin [1 ,2 ,3 ]
Ding, Tao [1 ,2 ]
Lu, Jiangtao [1 ,2 ]
Wang, Xiaodong [1 ,2 ]
Wang, Zhanshan [1 ,2 ]
机构：
[1] Tongji Univ, Dept Phys, Inst Precis Opt Engn, Shanghai 200092, Peoples R China
[2] Shanghai Key Lab Special Artificial Microstruct M, Shanghai 200092, Peoples R China
[3] Tongji Univ, Sch Aerosp Engn & Appl Mech, Shanghai 200092, Peoples R China
来源：
APPLIED OPTICS | 2011年 / 50卷 / 09期
基金：
中国国家自然科学基金;
关键词：
MULTILAYER COATINGS; THIN-FILMS; DEFECTS; INTENSIFICATION; DEPOSITION;
D O I：
10.1364/AO.50.00C357
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
A reactive electron beam evaporation process was used to fabricate 1.064 mu m HfO2/SiO2 high reflectors. The deposition process was optimized to reduce the nodular density. Cross-sectioning of nodular defects by a focused ion-beam milling instrument showed that the nodule seeds were the residual particles on the substrate and the particulates from the silica source "splitting." After optimizing the substrate preparation procedure and the evaporation process, a low nodular density of 2.7/mm(2) was achieved. The laser damage test revealed that the ejection fluences and damage growth behaviors of nodules created from deep or shallow seeds were totally different. A mechanism based on directional plasma scald was proposed to interpret observed damage growth phenomenon. (C) 2011 Optical Society of America
引用
收藏
页码：C357 / C363
页数：7
相关论文
共 50 条
  • [1] Using monodisperse SiO2 microspheres to study laser-induced damage of nodules in HfO2/SiO2 high reflectors
    Cheng, Xinbin
    Ding, Tao
    He, Wenyan
    Zhang, Jinlong
    Jiao, Hongfei
    Ma, Bin
    Shen, Zhengxiang
    Wang, Zhanshan
    ADVANCES IN OPTICAL THIN FILMS IV, 2011, 8168
  • [2] Preparation of SiO2/HfO2 high reflectors
    Key Laboratory of Advanced Micro-Structure Materials, Department of Physics, Tongji University, Shanghai 200092, China
    不详
    Qiangjiguang Yu Lizishu, 2012, 6 (1276-1280):
  • [3] 1064 nm laser conditioning effect of HfO2/SiO2 high reflectors deposited by E-beam
    Liu, Xiaofeng
    Li, Dawei
    Li, Xiao
    Zhao, Yuan'an
    Shao, Jianda
    Zhongguo Jiguang/Chinese Journal of Lasers, 2009, 36 (06): : 1545 - 1549
  • [4] Influence of composition and seed dimension on the structure and laser damage of nodular defects in HfO2/SiO2 high reflectors
    Wei, Chaoyang
    Yi, Kui
    Fan, Zhengxiu
    Shao, Jianda
    APPLIED OPTICS, 2012, 51 (28) : 6781 - 6788
  • [5] Effect of λ/2 SiO2 overcoat on the laser damage of HfO2/SiO2 high-reflector coatings
    胡建平
    马平
    许乔
    李伟
    Chinese Optics Letters, 2003, (06) : 340 - 342
  • [6] Laser damage testing of SiO2 and HfO2 thin films
    Di Giulio, M
    Alvisi, M
    Perrone, MR
    Protopapa, ML
    Valentini, A
    Vasanelli, L
    ADVANCES IN OPTICAL INTERFERENCE COATINGS, 1999, 3738 : 337 - 346
  • [7] Stress evolution in evaporated HfO2/SiO2 multilayers
    Li, Jingping
    Fang, Ming
    He, Hongbo
    Shao, Jianda
    6TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: OPTICAL TEST AND MEASUREMENT TECHNOLOGY AND EQUIPMENT, 2012, 8417
  • [8] High laser damage threshold HfO2/SiO2 mirrors manufactured by sputtering process
    Fornier, A
    Bernardino, D
    Lam, O
    Néauport, J
    Dufour, F
    Schmitt, B
    Mackowski, J
    THIRD INTERNATIONAL CONFERENCE ON SOLID STATE LASERS FOR APPLICATION TO INERTIAL CONFINEMENT FUSION, PTS 1 AND 2, 1999, 3492 : 912 - 920
  • [9] HfO2/SiO2 chirped mirrors manufactured by electron beam evaporation
    Zhang Jinlong
    Cheng Xinbin
    Wang Zhanshan
    Jiao Hongfei
    Ding Tao
    APPLIED OPTICS, 2011, 50 (09) : C388 - C391
  • [10] Effect of λ/2 silica overcoat on laser damage of HfO2/SiO2 high reflecting coating
    Hu, J.P.
    Qiu, F.M.
    Fu, X.Y.
    Zeng, X.
    2001, Editorial Office of High Power Laser and Particle Beams (13):
12345