Enhanced p-Channel Metal-Oxide-Semiconductor Field-Effect Transistor Charge Pump for Low-Voltage Applications

被引:3
|
作者
Hsu, Chien-Pin [1 ]
Wu, Hai-Ming [1 ]
Lin, Hongchin [1 ]
机构
[1] Natl Chung Hsing Univ, Dept Elect Engn, Taichung 402, Taiwan
关键词
EFFICIENCY; CIRCUITS;
D O I
10.1143/JJAP.49.04DE16
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, a power-efficient two-phase p-channel metal-oxide-semiconductor field-effect transistor (PMOSFET) charge pump with two auxiliary clocks to boost the gate biases of the switching transistors is proposed for low-voltage applications. It can increase overdrive voltages of the switching transistors, preserve low voltage drops within the transistors, and work well at a reduced supply voltage. Simulation results show that the proposed two-stage charge pump improves the voltage gain by more than 30% for 0.35 mu m complementary metal-oxide-semiconductor (CMOS) field-effect transistor (FET) technology and improves the maximum power efficiency by 40% for 0.18 mu m CMOS technology in comparison with Racape and Daga's charge pump. Measurement results show that the voltage gains of the proposed two-stage charge pump are more than 95.7 and 92% at supply voltages higher than 1.4 and 0.7 V for 0.35 and 0.18 mu m CMOS technologies, respectively. A compact model of power efficiency for the proposed charge pump is derived and verified by simulations and measurements. Results show that the power efficiency can be approximately 60% at low supply voltages. (C) 2010 The Japan Society of Applied Physics
引用
收藏
页数:6
相关论文
共 50 条
  • [21] Low-threshold-voltage HfOxN p-channel metal-oxide-semiconductor field-effect transistors with partially silicided platinum gate electrode
    Kadoshima, Masaru
    Nabatame, Toshihide
    Iwamoto, Kunihiko
    Mise, Nobuyuki
    Ota, Hiroyuki
    Ogawa, Arito
    Takahashi, Masashi
    Ikeda, Minoru
    Satake, Hideki
    Toriumi, Akira
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2006, 45 (8A): : 6225 - 6230
  • [22] Low-threshold-voltage HfOxN p-channel metal-oxide-semiconductor field-effect transistors with partially suicided platinum gate electrode
    Kadoshima, Masaru
    Nabatame, Toshihide
    Iwamoto, Kunihiko
    Mise, Nobuyuki
    Ota, Hiroyuki
    Ogawa, Arito
    Takahashi, Masashi
    Ikeda, Minoru
    Satake, Hideki
    Toriumi, Akira
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2006, 45 (8 A): : 6225 - 6230
  • [23] HYDROGENATION EFFECT IN AN N-CHANNEL METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR
    LEE, CH
    LEE, CC
    CHANG, KJ
    KIM, SC
    JANG, J
    APPLIED PHYSICS LETTERS, 1991, 58 (02) : 134 - 136
  • [24] Operation of the GaSb p-channel metal-oxide-semiconductor field-effect transistors fabricated on (111) A surfaces
    Nishi, K.
    Yokoyama, M.
    Yokoyama, H.
    Hoshi, T.
    Sugiyama, H.
    Takenaka, M.
    Takagi, S.
    APPLIED PHYSICS LETTERS, 2014, 105 (23)
  • [25] Threshold voltage shift and drain current degradation by negative bias temperature instability in Si (110) p-channel metal-oxide-semiconductor field-effect transistor
    Ota, K.
    Saitoh, M.
    Nakabayashi, Y.
    Ishihara, T.
    Uchida, K.
    Numata, T.
    APPLIED PHYSICS LETTERS, 2012, 100 (21)
  • [26] n-Channel Metal-Oxide-Semiconductor Field-Effect Transistor Modeling in Forward Body Bias Condition for Low Voltage Complementary Metal-Oxide-Semiconductor Circuits Design
    Aoki, Hitoshi
    Matsuzawa, Akira
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2012, 51 (04)
  • [27] Tunneling spectroscopy of metal-oxide-semiconductor field-effect transistor at low temperature
    Bao, MQ
    Liu, F
    Baron, F
    Wang, KL
    Li, RG
    APPLIED PHYSICS LETTERS, 2005, 86 (24) : 1 - 3
  • [28] HIGH-MOBILITY P-CHANNEL METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT-TRANSISTOR ON STRAINED SI
    NAYAK, DK
    WOO, JCS
    PARK, JS
    WANG, KL
    MACWILLIAMS, KP
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (4B): : 2412 - 2414
  • [29] High-mobility p-channel metal-oxide-semiconductor field-effect-transistor on strained Si
    Nayak, Deepak K.
    Woo, Jason C.S.
    Park, Jin S.
    Wang, Kang L.
    MacWilliams, Ken P.
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1994, 33 (4 B): : 2412 - 2414
  • [30] Boron penetration in p-channel metal-oxide-semiconductor field-effect transistors enhanced by gate ion-implantation damage
    Aoyama, T
    Suzuki, K
    Tashiro, H
    Tada, Y
    Arimoto, H
    Horiuchi, K
    JOURNAL OF APPLIED PHYSICS, 2001, 89 (08) : 4570 - 4574