Stability of a micromechanical pull-in voltage reference

被引:7
|
作者
Rocha, LA [1 ]
Cretu, E
Wolffenbuttel, RF
机构
[1] Delft Univ Technol, Dept Microelect, NL-2628 CD Delft, Netherlands
[2] Melexis, Tessenderlo, Belgium
关键词
DC voltage reference; microelectromechanical systems (MEMS); pull-in stability; reproducibility;
D O I
10.1109/TIM.2003.810007
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The reproducibility over temperature and time of the pull-in voltage of micromechanicat structures has been analyzed and verified using fabricated devices in silicon. The pull-in structures are intended for use as an on-chip voltage reference. Microbeams of 100-mum length, 3-mum width, and 11-mum thickness are electrostatically actuated with a very reproducible pull-in voltage at 9.1 V. Devices demonstrated an initial drift of - 12 mV over 10 days and stabilized within the 500-muV measurement uncertainty. The measured temperature coefficient of -1 mV/K is in good agreement with the analysis and is due to the combined effect of thermal expansion and the temperature dependence of the Young's modulus in silicon.
引用
收藏
页码:457 / 460
页数:4
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