Design of Complex Oxide Interfaces by Oxide Molecular Beam Epitaxy

被引:22
|
作者
Suyolcu, Y. E. [1 ]
Christiani, G. [1 ]
van Aken, P. A. [1 ]
Logvenov, G. [1 ]
机构
[1] Max Planck Inst Solid State Res, Heisenbergstr 1, D-70569 Stuttgart, Germany
基金
欧盟地平线“2020”;
关键词
Oxide molecular beam epitaxy; Complex oxides; High-temperature superconductivity; Hetero-structure interfaces; Scanning transmission electron microscopy; HIGH-TEMPERATURE SUPERCONDUCTIVITY; HIGH-TC SUPERCONDUCTIVITY; THIN-FILMS; TRANSITION-TEMPERATURE; EMERGENT PHENOMENA; DEFECT CHEMISTRY; ELECTRON-GAS; STRAIN; GROWTH; LA2-XSRXCUO4;
D O I
10.1007/s10948-019-05285-4
中图分类号
O59 [应用物理学];
学科分类号
摘要
Complex oxides provide a versatile playground for many phenomena and possible applications, for instance, high-temperature superconductivity, magnetism, ferroelectricity, metal-to-insulator transition, colossal magnetoresistance, and piezoelectricity. The origin of these phenomena is the competition between different degrees of freedom such as charge, orbital, and spin, which are interrelated with the crystal structure, the oxygen stoichiometry, and the doping dependence. Recent developments not only in the epitaxial growth technologies, such as reactive molecular beam epitaxy, but also in the characterization techniques, as aberration-corrected scanning transmission electron microscopy with spectroscopic tools, allow synthesizing and identifying epitaxial systems at the atomic scale. Combination of different oxide layers opens access to interface physics and leads to engineering interface properties, where the degrees of freedom can be artificially modified. In this review, we present different homo- and hetero-epitaxial interfaces with extraordinary structural quality and different functionalities, including high-temperature superconductivity, thermoelectricity, and magnetism.
引用
收藏
页码:107 / 120
页数:14
相关论文
共 50 条
  • [41] Molecular Beam Epitaxy of Materials Interfaces with Atomic Precision
    Ploog, K. H.
    SEMICONDUCTORS, 2018, 52 (05) : 615 - 617
  • [42] DYNAMICS OF INTERFACES IN A MODEL FOR MOLECULAR-BEAM EPITAXY
    SUN, T
    PLISCHKE, M
    PHYSICAL REVIEW E, 1994, 50 (05) : 3370 - 3382
  • [43] Molecular Beam Epitaxy of Materials Interfaces with Atomic Precision
    K. H. Ploog
    Semiconductors, 2018, 52 : 615 - 617
  • [44] ENHANCED ADHESION AT OXIDE OXIDE INTERFACES BY ION-BEAM STITCHING
    MUSKET, RG
    THOMAS, IM
    WILDER, JG
    APPLIED PHYSICS LETTERS, 1988, 52 (05) : 410 - 412
  • [45] Epitaxial growth of ZrO2 on GaN templates by oxide molecular beam epitaxy
    Gu, Xing
    Izyumskaya, Natalia
    Avrutin, Vitaly
    Xiao, Bo
    Morkoc, Hadis
    APPLIED PHYSICS LETTERS, 2007, 91 (02)
  • [46] Dynamic layer rearrangement during growth of layered oxide films by molecular beam epitaxy
    Lee, J. H.
    Luo, G.
    Tung, I. C.
    Chang, S. H.
    Luo, Z.
    Malshe, M.
    Gadre, M.
    Bhattacharya, A.
    Nakhmanson, S. M.
    Eastman, J. A.
    Hong, H.
    Jellinek, J.
    Morgan, D.
    Fong, D. D.
    Freeland, J. W.
    NATURE MATERIALS, 2014, 13 (09) : 879 - 883
  • [47] Graphitic carbon growth on crystalline and amorphous oxide substrates using molecular beam epitaxy
    Jerng, Sahng-Kyoon
    Yu, Dong Seong
    Lee, Jae Hong
    Kim, Christine
    Yoon, Seokhyun
    Chun, Seung-Hyun
    NANOSCALE RESEARCH LETTERS, 2011, 6 : 1 - 6
  • [48] DEPOSITION OF OXIDE-FILMS BY METAL-ORGANIC MOLECULAR-BEAM EPITAXY
    BADE, JP
    BAKER, EA
    KINGON, AI
    DAVIS, RF
    BACHMANN, KJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1990, 8 (02): : 327 - 331
  • [49] Graphitic carbon growth on crystalline and amorphous oxide substrates using molecular beam epitaxy
    Sahng-Kyoon Jerng
    Dong Seong Yu
    Jae Hong Lee
    Christine Kim
    Seokhyun Yoon
    Seung-Hyun Chun
    Nanoscale Research Letters, 6
  • [50] Real-time spectroscopic ellipsometry as a characterization tool for oxide molecular beam epitaxy
    Gibbons, BJ
    Hawley, ME
    Trolier-McKinstry, S
    Schlom, DG
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 2001, 19 (02): : 584 - 590