Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms

被引:59
|
作者
Bruneau, B. [1 ]
Novikova, T. [1 ]
Lafleur, T. [2 ]
Booth, J. P. [2 ]
Johnson, E. V. [1 ]
机构
[1] Ecole Polytech, CNRS, LPICM, F-91128 Palaiseau, France
[2] Ecole Polytech, CNRS, LPP, F-91128 Palaiseau, France
来源
PLASMA SOURCES SCIENCE & TECHNOLOGY | 2014年 / 23卷 / 06期
关键词
electron heating; PIC modelling; capacivitely-coupled plasma; tailored voltage waveforms; ion flux asymmetry; DISCHARGES; ELECTRONS; ARGON;
D O I
10.1088/0963-0252/23/6/065010
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Using particle-in-cell simulations, we predict that it is possible to obtain a significant difference between the ion flux to the powered electrode and that to the grounded electrode-with about 50% higher ion flux on one electrode-in a geometrically symmetric, radiofrequency capacitively-coupled plasma reactor by applying a non-sinusoidal, 'Tailored' voltage waveform. This sawtooth-like waveform presents different rising and falling slopes over one cycle. We show that this effect is due to differing plasma sheath motion in front of each electrode, which induces a higher ionization rate in front of the electrode which has the fastest positive rising voltage. Together with the higher ion flux comes a lower voltage drop across the sheath, and therefore a reduced maximum ion bombardment energy; a result in contrast to typical process control mechanisms.
引用
收藏
页数:9
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