Processing of ultra-hard coatings based on AlMgB14 films

被引：7

作者：

Yuzvyuk, M. H. ^{[1
]}

Putrolaynen, V. V. ^{[1
]}

Grishin, A. M. ^{[1
,2
,3
]}

机构：

[1] Petrozavodsk State Univ, Petrozavodsk 185910, Russia

[2] KTH Royal Inst Technol, SE-16440 Stockholm, Sweden

[3] INMATECH Intelligent Mat Technol, SE-12751 Skarholmen, Sweden

来源：

18TH INTERNATIONAL CONFERENCE PHYSICA.SPB | 2016年 / 769卷

关键词：

B THIN-FILMS;

D O I：

10.1088/1742-6596/769/1/012039

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

First time AlMgB14 films were prepared in Ames Lab by pulsed laser deposition technique. In this work, RF magnetron sputtering from a single stoichiometric target was employed to fabricate hard AlMgB14 coatings on Si wafer and industrial items. Measurements of nanohardness and elastic Young's modulus were performed to determine reliable strength characteristics of samples. Smooth 3 mu m thick AlMgB14 films with the RMS surface roughness to be less than 1 nm exhibit hardness of 34 GPa and modulus of elasticity of 230 GPa at 20 mN peak load.

引用

页数：6

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