Integrated process control for cluster tools using an in-line analytical module

被引：0

作者：

Kasko, I ^{[1
]}

Oechsner, R ^{[1
]}

Schneider, C ^{[1
]}

Froeschle, B ^{[1
]}

机构：

[1] Fraunhofer Inst Integrierte Schaltungen, D-91058 Erlangen, Germany

来源：

1997 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING CONFERENCE PROCEEDINGS | 1997年

关键词：

D O I：

10.1109/ISSM.1997.664618

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The paper describes a novel analytical module for in-line process control in cluster took. Having standardized mechanical and control interfaces (SEMI MESC/CTMC), the module can be easily attached to a cluster tool and integrated into the cluster control system like a process module. Equipped with an X-ray photoelectron spectrometer, the analytical module was used for in-line control of cleaning process in a gate stack cluster The measurement results were available immediately after wafer processing and the process parameters could be optimized just for the next wafer This module offers major advantages especially for fast process ramp-up and for process development.

引用

页码：P41 / P44

页数：4

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