Argon cluster size-dependence of sputtering yields of polymers: molecular weights and the universal equation

被引：11

作者：

Seah, M. P. ^{[1
]}

机构：

[1] Natl Phys Lab, Analyt Sci Div, Teddington TW11 0LW, Middx, England

来源：

SURFACE AND INTERFACE ANALYSIS | 2015年 / 47卷 / 01期

关键词：

Ar cluster size; GCIB; polystyrene; polymethylmethacrylate; sputtering yield; universal equation; MASS-SPECTROMETRY; IONS; MULTILAYERS; SIMS;

D O I：

10.1002/sia.5656

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

An analysis is provided of the data of Cristaudo et al. for the sputtering yields of polystyrene and polymethylmethacrylate by argon cluster ion beams as a function of their molecular weight. This analysis is made using the universal sputtering equation of Seah to evaluate the effect of the end-group density on the parameter A. This parameter is thought to be related to the average energy per atom (excluding hydrogen) to liberate fragments and it is shown that A decreases as the end-group density rises in the manner expected. Equations are provided relating A to the molecular weight or the end-group density that are obeyed for both materials. Copyright (c) 2014 Crown Copyright.

引用

页码：169 / 172

页数：4

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