On the Thermal Models for Resistive Random Access Memory Circuit Simulation

被引:41
|
作者
Roldan, Juan B. [1 ]
Gonzalez-Cordero, Gerardo [1 ]
Picos, Rodrigo [2 ]
Miranda, Enrique [3 ]
Palumbo, Felix [4 ]
Jimenez-Molinos, Francisco [1 ]
Moreno, Enrique [5 ]
Maldonado, David [1 ]
Baldoma, Santiago B. [6 ]
Moner Al Chawa, Mohamad [7 ]
de Benito, Carol [2 ]
Stavrinides, Stavros G. [8 ]
Sune, Jordi [3 ]
Chua, Leon O. [9 ]
机构
[1] Univ Granada, Fac Ciencias, Dept Elect & Tecnol Computadores, Avd Fuentenueva S-N, Granada 18071, Spain
[2] Univ Balearic Isl, Ind Engn & Construct Dept, Palma De Mallorca 07122, Spain
[3] Univ Autonoma Barcelona, Dept Engn Elect, Edifici Q, Bellaterra 08193, Spain
[4] Consejo Nacl Invest Cient & Tecn, Consejo Nacl Invest Cient & Tecn, Godoy Cruz 2290,C1425FQB, Buenos Aires, DF, Argentina
[5] Univ Lyon, CNRS, UMR 5516, Grad Sch,Inst Opt,UJM St Etienne,Lab Hubert Curie, F-42023 St Etienne, France
[6] Univ Tecnol Nacl, Fac Reg Buenos Aires, Unidad Invest & Desarrollo Ingn UIDI, Medrano 951,C1179AAQ, Buenos Aires, DF, Argentina
[7] Tech Univ Dresden, Inst Circuits & Syst, D-01062 Dresden, Germany
[8] Int Hellen Univ, Sch Sci & Technol, Thermi Univ Campus, Thessaloniki 57001, Greece
[9] Univ Calif Berkeley, Elect Engn & Comp Sci Dept, Berkeley, CA 94720 USA
关键词
resistive memories; thermal model; heat equation; thermal conductivity; circuit simulation; compact modeling; resistive switching; nanodevices; QUANTUM POINT-CONTACT; SPICE COMPACT MODEL; SWITCHING MEMORY; CONDUCTANCE QUANTIZATION; RRAM DEVICES; TEMPERATURE-DEPENDENCE; PROGRESSIVE BREAKDOWN; RESET TRANSITIONS; HFO2-BASED RRAM; MIM STRUCTURES;
D O I
10.3390/nano11051261
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Resistive Random Access Memories (RRAMs) are based on resistive switching (RS) operation and exhibit a set of technological features that make them ideal candidates for applications related to non-volatile memories, neuromorphic computing and hardware cryptography. For the full industrial development of these devices different simulation tools and compact models are needed in order to allow computer-aided design, both at the device and circuit levels. Most of the different RRAM models presented so far in the literature deal with temperature effects since the physical mechanisms behind RS are thermally activated; therefore, an exhaustive description of these effects is essential. As far as we know, no revision papers on thermal models have been published yet; and that is why we deal with this issue here. Using the heat equation as the starting point, we describe the details of its numerical solution for a conventional RRAM structure and, later on, present models of different complexity to integrate thermal effects in complete compact models that account for the kinetics of the chemical reactions behind resistive switching and the current calculation. In particular, we have accounted for different conductive filament geometries, operation regimes, filament lateral heat losses, the use of several temperatures to characterize each conductive filament, among other issues. A 3D numerical solution of the heat equation within a complete RRAM simulator was also taken into account. A general memristor model is also formulated accounting for temperature as one of the state variables to describe electron device operation. In addition, to widen the view from different perspectives, we deal with a thermal model contextualized within the quantum point contact formalism. In this manner, the temperature can be accounted for the description of quantum effects in the RRAM charge transport mechanisms. Finally, the thermometry of conducting filaments and the corresponding models considering different dielectric materials are tackled in depth.
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页数:46
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