In situ and ex situ characterization of thin films by soft X-ray emission spectroscopy

被引：20
|
作者：
Guo, JH
Skytt, P
Wassdahl, N
Nordgren, J
机构：
[1] Univ Uppsala, Dept Phys, S-75121 Uppsala, Sweden
[2] ABB Corp Res, Avd D, S-72178 Vasteras, Sweden
[3] ITE, S-83125 Ostersund, Sweden
来源：
JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA | 2000年 / 110卷 / 1-3期
关键词：
D O I：
10.1016/S0368-2048(00)00156-0
中图分类号：
O433 [光谱学];
学科分类号：
0703 ; 070302 ;
摘要：
Soft X-ray emission spectroscopy has been used as a chemical probe in the characterization of thin film materials. Some examples of soft X-ray emission studies are presented to show the chemical sensitivity, site selectivity and depth dependence of this method. The substantial penetration of soft X-rays offers true bulk probing and facilitates studies of interfaces and buried structures. By choosing the proper geometry soft X-ray emission spectroscopy provides a non-destructive chemical analysis of sandwich structures. This technique has also been used to enable in situ and real-time characterization of thin films during vapor deposition growth. (C) 2000 Elsevier Science BN. All rights reserved.
引用
收藏
页码：41 / 67
页数：27
相关论文
共 50 条
  • [31] In-situ/operando soft x-ray spectroscopy characterization of interfacial phenomena in energy materials and devices
    Liu, Yi-Sheng
    Glans, Per-Anders
    Arthur, Timothy S.
    Mizuno, Fuminori
    Chang, Chinglin
    Pong, Way-Faung
    Guo, Jinghua
    SOLAR HYDROGEN AND NANOTECHNOLOGY X, 2015, 9560
  • [32] In situ/operando soft x-ray spectroscopy of energy, environment and chemical sciences
    Guo, Jinghua
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 2018, 256
  • [33] Epitaxial EuO thin films by pulsed laser deposition monitored by in situ x-ray photoelectron spectroscopy
    Beukers, J. N.
    Kleibeuker, J. E.
    Koster, G.
    Blank, D. H. A.
    Rijnders, G.
    Hilgenkamp, H.
    Brinkman, A.
    THIN SOLID FILMS, 2010, 518 (18) : 5173 - 5176
  • [34] Ex situ metrology of x-ray diffraction gratings
    Yashchuk, Valeriy V.
    McKinney, Wayne R.
    Artemiev, Nikolay A.
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2013, 710 : 59 - 66
  • [35] Structure of reactively sputter deposited tin-nitride thin films:: A combined X-ray photoelectron spectroscopy, in situ X-ray reflectivity and X-ray absorption spectroscopy study
    Lützenkirchen-Hecht, D
    Frahm, R
    THIN SOLID FILMS, 2005, 493 (1-2) : 67 - 76
  • [36] Soft x-ray emission spectroscopy in the nineties
    Nordgren, EJ
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 1996, 78 : 25 - 30
  • [37] Instrumentation for soft X-ray emission spectroscopy
    Nordgren, J
    Guo, JH
    JOURNAL OF ELECTRON SPECTROSCOPY AND RELATED PHENOMENA, 2000, 110 (1-3) : 1 - 13
  • [38] In Situ Electrochemistry of Formate on Cu Thin Films Using ATR-FTIR Spectroscopy and X-ray Photoelectron Spectroscopy
    Hsu, Jason
    Houache, Mohamed S. E.
    Abu-Lebdeh, Yaser
    Patton, Reagan A.
    Guzman, Marcelo I.
    Al-Abadleh, Hind A.
    LANGMUIR, 2024, 40 (04) : 2377 - 2384
  • [39] In situ X-ray absorption spectroscopy of germanium evaporated thin film electrodes
    Baggetto, Loic
    Hensen, Emiel J. M.
    Notten, Peter H. L.
    ELECTROCHIMICA ACTA, 2010, 55 (23) : 7074 - 7079
  • [40] Characterization of thin films by means of soft X-ray reflectivity measurements
    Friedrich, J
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, PTS 1 AND 2, 1999, 475 : 492 - 495
12345