Fundamentals and advantages of ultrafast micro-structuring of transparent materials

被引:90
|
作者
Ashkenasi, D
Müller, G
Rosenfeld, A
Stoian, R
Hertel, IV
Bulgakova, NM
Campbell, EEB
机构
[1] Laser & Med Technol GmbH, D-12489 Berlin, Germany
[2] Max Born Inst, D-12489 Berlin, Germany
[3] SB RAS, Inst Thermophys, Novosibirsk, Russia
[4] Chalmers Univ Technol, S-41296 Gothenburg, Sweden
[5] Univ Gothenburg, Gothenburg, Sweden
来源
关键词
D O I
10.1007/s00339-003-2143-3
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Experimental investigations using femtosecond and picosecond laser pulses at 800 nm illuminate the distinctions between the dynamics and nature of ultrafast processing of dielectrics compared with semiconductors and metals. Dielectric materials are strongly charged at the surface on the sub-ps time scale and undergo an impulsive Coulomb explosion prior to thermal ablation. Provided the laser pulse width remains in the ps or sub-ps time domain, this effect can be exploited for processing. In the case of thermal ablation alone, the high localization of energy accompanied by ultrafast laser micro-structuring is of great advantage also for high quality processing of thin metallic or semiconducting layers, in which the surface charge is effectively quenched.
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页码:223 / 228
页数:6
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